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East Lansing

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"Research Associate-Fixed Term"

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Research Associate-Fixed Term

Position Summary

A postdoctoral research associate position is available in the Department of Electrical and Computer Engineering. This is an 18-month position with extension contingent on funding and performance. The research associate will work on a project related to radiation-hardened microelectronic chips for space communications. In particular, we seek a candidate with cleanroom fabrication expertise for semiconductor applications. The research associate will have the following responsibilities:

Responsibilities:

  • Uphold lab upkeep and maintenance standards to ensure a safe and efficient research environment and management of ongoing projects
  • Advancing cleanroom microfabrication processes regarding semiconductor membrane fabrication and micro-transfer printing
  • Manuscript writing for peer-reviewed publications
  • Supervision of undergraduate students, and interns
  • Technical report writing of engineering projects
  • Ensure project and lab compliance with environmental, safety, health, and quality program (ISO9001) requirements
  • Other duties as assigned

Radiation-Hardened Phased Array Technology For 6G Non-Terrestrial Networks

The use of higher performance phased arrays to support future 5G and 6G mobile network technology standards is a growing trend in the space-based communications market. This shift involves replacing vacuum tube amplifiers with microelectronic chip amplifiers that outperform the current systems, but adapting them for the harsh environment of space presents challenges. This project addresses two significant barriers: thermal management and radiation tolerance.

A buildup of heat can affect the transistors’ tolerance to high-energy particles from the sun and other cosmic bodies, making them more susceptible to single event effects (SEE) that disrupt space communications or even end multi-billion-dollar space missions. However, incorporating a diamond layer beneath a transistor body could help dissipate heat and effectively trap radiation-induced charges, protecting the sensitive transistors.

The project aims to refine the processing and polishing of polycrystalline diamond (PCD) membranes to create suitable surfaces for interfacing with thinned gallium nitride (GaN) transistors, develop amplifier circuits by integrating these transistors with other electrical components to efficiently amplify radio frequency (RF) signals, and assess the radiation performance of the devices by testing their sensitivity to radiation exposure. It leverages recent advances in PCD membranes by MSU and Fraunhofer USA, as well as the new SEE space electronics testing facility being built on campus. These advances will position the University as a leader in advanced space communication technologies.

Equal Employment Opportunity Statement

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, citizenship, age, disability or protected veteran status.

Required Degree

Doctorate -Electrical Engineering, Physics, Mechanical Engineering, Materials Science or a related engineering or science field with a strong background in plasma science

Minimum Requirements

Required Qualifications:

  • PhD. required in Electrical Engineering, Physics, Mechanical Engineering, Materials Science or a related engineering or science field with a strong background in plasma science
  • Prior expertise working in, and performing research in, a semiconductor cleanroom environment
  • Prior expertise in photolithography
  • Prior expertise in using reactive ion etching plasma tools
  • Prior expertise in semiconductor characterization techniques
  • Excellent technical writing and oral communication skills
  • A proven record of establishing and maintaining a safe laboratory and workplace environment
  • Able to work in an interdisciplinary, diverse, and international team
  • Familiarity with Microsoft Office software (Excel, Word, and PowerPoint)

Desired Qualifications

Preferred Qualifications:

  • Prior working experience in microwave plasma assisted chemical vapor deposition (MPACVD) of thin film materials such as polycrystalline diamond (PCD)
  • Prior working experience in material characterization, such as Scanning Electron Microscopy, Raman spectroscopy, Atomic Force Microscopy, and X-Ray Diffraction
  • Prior experience with operation, assembly, and maintenance of vacuum systems is strongly desired

Required Application Materials

CV, cover letter, and at least three references

Special Instructions

Review of applications will begin on December 5, 2025, and continue until the position is filled.

Review of Applications Begins On

12/05/2025

Website

https://engineering.msu.edu/about/departments/ece

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