ARCNL - Advanced Research Center for Nanolithography Campuses

The Advanced Research Center for Nanolithography (ARCNL) at its Amsterdam Science Park campus focuses primarily on cutting-edge research programs rather than traditional undergraduate courses. However, it offers specialized graduate-level training, PhD programs, and short courses in nanolithography and related fields, often in collaboration with partner universities like the University of Amsterdam and Vrije Universiteit Amsterdam. These programs emphasize hands-on research in plasma physics, optics, and materials science tailored to the semiconductor industry.

• PhD Program in Nanolithography: This multi-year doctoral program trains students in extreme ultraviolet (EUV) lithography techniques, covering topics such as light-matter interactions, plasma sources for EUV generation, and nanoscale patterning. Participants engage in experimental and theoretical work, developing skills in laser physics and vacuum technology. The curriculum includes seminars on lithography challenges in chip manufacturing, with practical sessions using state-of-the-art facilities like the ARCNL cleanrooms.
• Advanced Optics and Photonics Course: A intensive short course exploring optical systems for nanolithography, including diffraction limits, lens design, and aberration correction. Students learn to model and simulate optical setups using software like Zemax, with applications to mask inspection and metrology in semiconductor production.
• Plasma Science and Technology Workshop: Focused on plasma physics for lithography, this program delves into high-harmonic generation, ion beam etching, and plasma diagnostics. It includes laboratory modules on generating and controlling plasmas for precise material removal at the nanoscale, addressing issues like stochastic noise in EUV sources.
• Materials for Nanolithography Seminar Series: Covering photoresists, thin films, and novel materials for next-generation chips. Topics include chemical amplification, EUV resist sensitivity, and atomic layer deposition. Participants analyze material performance through simulations and experiments, preparing for roles in industry R&D.
• Computational Modeling in Lithography: A course on numerical methods for simulating lithography processes, using tools like MATLAB and COMSOL. It teaches finite element analysis for heat transfer in exposure tools and Monte Carlo simulations for photon scattering in resists.

These offerings integrate interdisciplinary approaches, combining physics, chemistry, and engineering to tackle the frontiers of miniaturization in electronics. With access to unique ARCNL labs, such as the EUV beamline and ultrafast laser facilities, students gain practical expertise essential for careers in high-tech industries like ASML and Intel. The campus environment fosters collaboration, with regular guest lectures from global experts. Overall, ARCNL's programs equip researchers with the knowledge to innovate in sustainable and efficient nanomanufacturing, pushing the boundaries of Moore's Law. Enrollment is selective, targeting master's graduates in STEM fields, and emphasizes publication of research findings in top journals.