Development of a multidimensional hydrodynamic-radiative model of tin plasmas for the optimisation of EUV sources at 13.5 nm

Is the Job related to staff position within a Research Infrastructure? No

Offer Description

Extreme ultraviolet (EUV) emission at 13.5 nm from tin plasma is essential for next-generation nanolithography in the semiconductor industry, but optimizing its conversion efficiency (CE) is challenging. Understanding how laser parameters, such as wavelength, pulse duration, and time structure, influence plasma dynamics and EUV yield is crucial for designing more efficient, compact, and robust EUV sources. This project aims to develop a 2D hydrodynamic-radiative model to simulate laser-tin interactions, taking into account laser absorption, plasma expansion, and EUV emission processes. This model will use experimental parameters as input and will be validated using yield and spectroscopic data.

Where to apply

E-mail: francois.vidal@inrs.ca

Requirements

Research Field: Physics » Computational physics

Education Level: Master Degree or equivalent

Skills/Qualifications

The ideal candidate would possess a solid general background in physics—preferably in plasma physics and laser-matter interaction—as well as a keen interest in the computational modeling of physical phenomena.

Languages: ENGLISH

Level: Good

Research Field: Physics » Computational physics

Additional Information

Work Location(s)

• Number of offers available: 1
• Company/Institute: Institut national de la recherche scientifique
• Country: Canada
• State/Province: Québec
• City: Varennes
• Postal Code: J3X 1P7
• Street: 1650 Lionel-Boulet Blvd.

Contact

• State/Province: Québec
• City: Varennes
• Website: https://inrs.ca/en/inrs/research-centres/energie-materiaux-telecommunications-research-centre/
• Street: 1650 Lionel-Boulet Blvd.
• Postal Code: J3X 1P7
• E-Mail: francois.vidal@inrs.ca
• Phone: 15142286918