ARCNL - Advanced Research Center for Nanolithography
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Amsterdam, The Netherlands
This experiment-oriented postdoctoral position lies at the interface of fluid mechanics, phase-change physics, and industrial application. It is part of ARCNL’s Source Department and the EUV Plasma Processes group. We investigate the fundamental dynamics of liquid-tin targets and plasmas that underpin present and future extreme-ultraviolet (EUV) light sources for nanolithography. This project is carried out in close collaboration with industry.
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ARCNL - Advanced Research Center for Nanolithography
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