Postdoctoral Researcher in the Development of Thin Films and Deposition Processes using Artificial Intelligence and Autonomous Experiments.

well-being of society for a future worth living. Empa is a research institution of the ETH Domain. The Coating Technologies Group in Empa's Laboratory for Surface Science & Coating Technologies develops next-generation functional thin films through innovative deposition processes and high-throughput materials screening. The opportunity Contribute to groundbreaking research on accelerated thin-film and process development for emerging applications such as ferroelectric memory, photonic integrated circuits and next-generation telecommunications. You'll work at the exciting intersection of experimental materials science and materials informatics, collaborating in an interdisciplinary team. Postdoctoral Researcher in the Development of Thin Films and Deposition Processes using Artificial Intelligence and Autonomous Experiments. Your tasks Conduct physical vapor deposition experiments using advanced PVD processes such as synchronized HiPIMS Perform in-depth materials characterization and surface analysis Apply and improve high-throughput experimental workflows including closed-loop thin-film optimization Apply AI and Machine Learning for data analysis and modelling Develop, improve and implement HW/SW concepts and components to automate experiments and enable autonomous experiments The focus of this position is to use advanced PVD processes to develop state-of-the art thin films, such as piezoelectric and ferroelectric nitrides. You will use synchronized HiPIMS processes to tune the properties and performance of the films. The experiments will be informed by in-situ surface and interface analysis. Your work will make use of our group's unique comprehensive infrastructure for materials and device characterization. In addition, the work will benefit from a unique self-driving thin-film laboratory. This laboratory is currently in development and will include sputter deposition and in-situ surface analysis techniques such as RHEED, AES and XPS. Part of the work is also to optimize the workflows in this laboratory in collaboration with the team. Your profile PhD degree in physics, materials science, chemistry, electrical engineering or a related discipline Knowledge of UHV and thin-film technology Prior experience in PVD and surface science Prior experience with piezoelectric- or ferroelectric nitrides is an advantage Knowledge of PVD process development and pulsed sputtering is an advantage Proficiency in Python programming Interest in lab-automation and working with agentic AI (e.g. Claude Code, Codex) Excellent communication skills in English Strong academic track-record and publication history The ability to collaborate in a multidisciplinary research environment is essential. Personal initiative, ability to work systematically, reliability, responsibility, teamwork and communication skills are a must. Our offer Collaborative, international research environment Challenging projects bridging fundamental research and applied research for industry Access to cutting-edge research facilities and equipment including unique thin-film deposition infrastructure Opportunities for professional growth and networking Competitive salary and benefits package The contract duration is initially for two years with the possibility of extension and a long-term perspective in the team. The position is available from 1 December 2026 or later upon agreement. We live a culture of inclusion and respect. We welcome all people who are interested in innovative, sustainable and meaningful activities - that's what counts. We look forward to receiving your complete online application including a letter of motivation, CV, certificates, diplomas and contact details of two reference persons. Please submit these exclusively via our job portal. Applications by e-mail and by post will not be considered.