PROGRAM SCIENTIST, MIT.nano, will help the broader MIT.nano research community better understand the complexity of atomic layer deposition (ALD), and optionally also plasma etching, and contribute to new trends, methods, and knowledge in the lab. The position will not conduct original research and is not meant to be a direct continuation of a candidate’s prior research work. In collaboration with MIT.nano staff, will identify current and emerging broad process challenges, prioritize them and find solution approaches and aggregate and disseminate this knowledge across MIT.nano. This will be done by identifying knowledge bottlenecks, reviewing the literature, designing experiments to understand and improve tool performance, and by summarizing findings in white papers and application notes for the MIT.nano user community.
Job Requirements
REQUIRED: A PhD in an engineering or science discipline related to micro/nano-fabrication; a minimum of two years of related experience in a research environment (which may include experience as a graduate student); excellent research and publication record, and proven ability to communicate and teach; proven ability to independently design, execute, and optimize a broad range of fabrication processes; practical and theoretical familiarity with many process categories (e.g. lithography,ALD, ALE, plasma etching, PECVD deposition, diffusion, etc.), but in-depth knowledge of ALD and/or plasma etching is required; expertise in data management and processing, and associated programming experience (e.g. Python, MATLAB, etc.); be methodical, detail-oriented, and a critical thinker that is willing to learn and perform a wide range of tasks with minimal supervision; and enthusiasm for educating students about processing, fabrication solutions and approaches. PREFERRED: Experience interfacing with equipment vendors and the semiconductor/equipment industry. Familiarity with shared/core facility operations and lab management.