"Postdoc position on Form Adaptive Multilayer Engineering (FAME)"

Job Summary

Staying in focus is a fundamental challenge in highly demanding optical systems where imaging plays a central role, from microscopes to telescopes, and for advanced lithography. For the next-generation hyper-NA lithographic tool of ASML, demands require innovative solutions to adapt the wafer surface position on the nm level. An elegant method is to include an adaptive element into the wafer stage for local modification of the surface height via a form adaptive multilayer.

Key Responsibilities

• Develop an overview of available materials and fundamental processes leading to densification or expansion upon heating in two-material multilayers.
• Synthesize multilayers, tailoring their structure by varying deposition conditions and introducing barrier layers to control response to thermal activation.
• Develop usage of metrology tools to characterize structural changes inside the multilayer connected to shrinkage or expansion.
• Collaborate with industrial partner to demonstrate functional behavior using localized heating.

Requirements

You have a PhD degree in solid state physics, materials science, computational physics or chemistry, or a related field. You have experience in thin film deposition and metrology, data analysis in Matlab or Python, and are willing to improve these skills. You enjoy experimental and computational physics, work independently and collaboratively, are an excellent team player, creative, motivated to address scientific challenges, and fluent in English for collaboration with industrial and academic parties.

What the Employer Offers

You will be appointed on a full-time position for 2 years. The salary is between €4,060 and €5,331 gross per month depending on experience. Additional benefits include a holiday allowance of 8% of the gross annual salary, a year-end bonus of 8.3%, a solid pension scheme, a minimum of 29 holiday days, and numerous professional and personal development programs. The position is within the XUV Optics group at the MESA+ Institute at the University of Twente.